Vapor deposition is a process used in the fields of materials science and engineering to create thin films of materials on a substrate surface. In this process, a solid material is heated to create a vapor, which is then deposited onto a substrate where it condenses to form a thin film. This technique is commonly used for creating coatings, semiconductors, and other thin film materials with specific properties. Vapor deposition can be done through various methods such as physical vapor deposition (PVD) or chemical vapor deposition (CVD), each with its own unique set of advantages and applications. Overall, vapor deposition is a versatile and widely used technique in the fabrication of advanced materials for various industrial and scientific purposes.